We have elucidated the mechanism for B migration in the amorphous (a-) Si network. B diffusivity in a-Si is much higher than in crystalline Si; it is transient and increases with B concentration up to 2 x 1020 B/cm3. At higher density, B atoms in a-Si quickly precipitate. B diffusion is indirect, mediated by dangling bonds (DB) present in a-Si. The density of DB is enhanced by B accommodation in the a-Si network and decreases because of a-Si relaxation. Accurate data simulations allow one to extract the DB diffusivity, whose activation energy is 2.6 eV. Implications of these results are discussed.
B clustering in amorphous Si D. De Salvador, G. Bisognin, M. Di Marino, E. Napolitani, A. Carnera, S. Mirabella, E. Pecora, E. Bruno, F. Priolo, H. Graoui, M. A. Foad, F. Boscherini The Journal of Vacuum Science and Technology B 26, 382 (2008)
The authors have investigated the role of the Si excess on the photoluminescence properties of Er doped substoichiometric SiOx layers. They demonstrate that the Si excess has two competing roles: when agglomerated to form Si nanoclusters Si-nc’s it enhances the Er excitation efficiency but it also introduces new nonradiative decay channels. When Er is excited through an energy transfer from Si-nc’s, the beneficial effect on the enhanced excitation efficiency prevails and the Er emission increases with increasing Si content. However, when pumped resonantly, the Er luminescence intensity always decreases with increasing Si content. These data are presented and their implications are discussed.